Photolithography device for generating pattern on a photoresist substrate
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United States of America Patent
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Jun 9, 2020
Grant Date -
Aug 8, 2019
app pub date -
Oct 20, 2017
filing date -
Oct 21, 2016
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Abstract
In one embodiment of the disclosure, it is proposed a photolithography device for generating structure on a photoresist substrate, the photolithography device comprising a light illumination unit and a photomask. The photomask is remarkable in that it comprises at least one layer of dielectric material and a medium having a refractive index lower than that of said dielectric material, wherein a surface of said at least one layer of dielectric material has at least one abrupt change of level forming a step, and wherein at least a base and lateral part of said surface, with respect to said step and a propagation direction of an electromagnetic wave from said light illumination unit, is in contact with said medium.
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