Rotary charge stripping film in charge stripping device of ion beam and charge stripping method of ion beam

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United States of America Patent

PATENT NO 11581105
APP PUB NO 20190237212A1
SERIAL NO

16320340

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An object of the present invention is to provide a charge stripping film in a charge stripping device of an ion beam, which has high heat resistance and no toxicity, with which there is no risk of activation, with which an ion beam can be made multivalent even if the charge stripping film is thin, and which is resistant to high-energy beam radiation over an extended period of time. The present invention comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film having a thermal conductivity of 20 W/mK or more in a film surface direction at 25° C., and a film thickness of the carbon film is more than 3 μm and less than 10 μm. The present invention also comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film produced by a polymer annealing method, and a film thickness of the carbon film is more than 3 μm and less than 10 μm.

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Patent Owner(s)

Patent OwnerAddress
KANEKA CORPORATION2-3-18 NAKANOSHIMA KITA-KU OSAKA-SHI OSAKA 530-8288
RIKEN2-1 HIROSAWA WAKO-SHI SAITAMA 3510198

International Classification(s)

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  • 2017 Application Filing Year
  • C01B Class
  • 2099 Applications Filed
  • 1477 Patents Issued To-Date
  • 70.37 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hasebe, Hiroo Saitama, JP 3 4
Murakami, Mutsuaki Osaka, JP 88 993
Tachibana, Masamitsu Osaka, JP 25 121
Tatami, Atsushi Osaka, JP 18 70

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges15132218101 - 1011 - 2021 - 3001002003004005006007008009001000110012001300140015001600

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