Rotary charge stripping film in charge stripping device of ion beam and charge stripping method of ion beam
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 14, 2023
Grant Date -
Aug 1, 2019
app pub date -
Jul 27, 2017
filing date -
Aug 5, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An object of the present invention is to provide a charge stripping film in a charge stripping device of an ion beam, which has high heat resistance and no toxicity, with which there is no risk of activation, with which an ion beam can be made multivalent even if the charge stripping film is thin, and which is resistant to high-energy beam radiation over an extended period of time. The present invention comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film having a thermal conductivity of 20 W/mK or more in a film surface direction at 25° C., and a film thickness of the carbon film is more than 3 μm and less than 10 μm. The present invention also comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film produced by a polymer annealing method, and a film thickness of the carbon film is more than 3 μm and less than 10 μm.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
KANEKA CORPORATION | 2-3-18 NAKANOSHIMA KITA-KU OSAKA-SHI OSAKA 530-8288 | |
RIKEN | 2-1 HIROSAWA WAKO-SHI SAITAMA 3510198 |
International Classification(s)

- 2017 Application Filing Year
- C01B Class
- 2099 Applications Filed
- 1477 Patents Issued To-Date
- 70.37 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Hasebe, Hiroo | Saitama, JP | 3 | 4 |
# of filed Patents : 3 Total Citations : 4 | |||
Murakami, Mutsuaki | Osaka, JP | 88 | 993 |
# of filed Patents : 88 Total Citations : 993 | |||
Tachibana, Masamitsu | Osaka, JP | 25 | 121 |
# of filed Patents : 25 Total Citations : 121 | |||
Tatami, Atsushi | Osaka, JP | 18 | 70 |
# of filed Patents : 18 Total Citations : 70 |
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Patent Citation Ranking
- 0 Citation Count
- C01B Class
- 0 % this patent is cited more than
- 2 Age
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