THERMALLY-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND PREPARATION METHOD THEREOF

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United States of America Patent

APP PUB NO 20190235376A1
SERIAL NO

16382195

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Abstract

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Provided is a thermally-developable photosensitive material having a support, an image forming layer, which contains at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, on one surface of the support, and a non-photosensitive back layer on the other surface of the support, in which either the image forming layer or the image forming layer and the non-photosensitive back layer contain an infrared absorbing dye which absorbs at least infrared having a wavelength equal to or longer than 700 nm. Also provided is a manufacturing method of the thermally-developable photosensitive material.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HASHI, Yoshihisa Kanagawa, JP 6 7
JIMBO, Yoshihiro Kanagawa, JP 57 234
SHIMOYAMA, Munenori Kanagawa, JP 1 0

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