PHOTORESIST AND PREPARATION METHOD THEREOF
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United States of America Patent
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Issued Date -
Jul 4, 2019
app pub date -
May 31, 2018
filing date -
May 31, 2018
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Abstract
The present disclosure provides a photoresist and a preparation method thereof. The photoresist includes at least one kind of resin, a photoinitiator, a solvent, and at least one kind of scattering particle, and the at least one kind of scattering particle being configured to scatter ultraviolet light irradiated into the photoresist. The present disclosure may increase an exposure energy that the photoresist obtains during an exposure process, and thereby may reduce an exposure time required for the photoresist.
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