CHARGED PARTICLE BEAM SYSTEM AND METHODS

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United States of America Patent

APP PUB NO 20190189392A1
SERIAL NO

16285786

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Disclosed is a charged particle beam system comprising a charged particle beam column having a charged particle source forming a charged particle beam, an objective lens and a first deflection system for changing a position of impingement of the charged particle beam in a sample plane. The system further comprises a sample chamber comprising a sample stage for holding a sample to be processed, and a controller configured to create and store a height map of a sample surface. The controller is further configured to dynamically adjust the objective lens of the charged particle beam in dependence on a position of impingement of the charged particle beam according to the height map.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS MICROSCOPY LLCONE ZEISS DRIVE THORNWOOD NY 10594

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goetze, Bernhard Cambridge, US 3 30
Huynh, Chuong Quincy, US 11 26
Notte,, IV John A Gloucester, US 46 887
Stewart, Diane Ipswich, US 2 8

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