Optical proximity correction (OPC) method and method of manufacturing mask by using the OPC method
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United States of America Patent
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Jun 16, 2020
Grant Date -
Jun 20, 2019
app pub date -
Jul 5, 2018
filing date -
Dec 18, 2017
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An optical proximity correction (OPC) whereby corner rounding may be effectively controlled, and a mask manufacturing method performed using the OPC method are provided. According to the OPC method, an inner edge is generated through decomposition of a layout, and a displacement (DISin_frag) of an inner fragment and a displacement (DISsel) of a selected fragment are calculated based on the inner edge to additionally displace a fragment, so as to manufacture a mask layout with minimized corner rounding without violating mask rule check (MRC).
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Patent Citation Ranking
- 1 Citation Count
- G03F Class
- 48.28 % this patent is cited more than
- 5 Age
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| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Dec 16, 2027 |
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