PHOTOMASKS, METHODS OF MANUFACTURING PHOTOMASKS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE USING PHOTOMASKS
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United States of America Patent
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Issued Date -
Jun 13, 2019
app pub date -
Jun 25, 2018
filing date -
Dec 11, 2017
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Abstract
A photomask is provided. The photomask comprises: a low thermal expansion material (LTEM) substrate including a first surface and a second surface; a reflective layer disposed on the first surface of the low thermal expansion material substrate and including first material layers and second material layers, which are stacked alternately; a light absorbing pattern on the reflective layer; and a conductive layer on the second surface of the low thermal expansion material substrate, wherein the low thermal expansion material substrate includes a correction defect correcting the light absorbing pattern, and the conductive layer is one of ruthenium oxide (RuO2), iridium oxide (IrO2), and/or a combination thereof.
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