CHAMBER APPARATUS, TARGET GENERATION METHOD, AND EUV LIGHT GENERATION APPARATUS
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United States of America Patent
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Issued Date -
May 23, 2019
app pub date -
Jan 29, 2019
filing date -
Jan 29, 2019
priority date (Note) -
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status (Latency Note)
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Abstract
In a chamber apparatus that includes a chamber and a target generation device configured to supply tin as a target material to a certain region in the chamber, oxidation of molten tin is prevented. A chamber apparatus includes: a chamber (1); a target generation device including a tank part (32) configured to store tin T, a variable temperature device (33, 38) configured to change a temperature of the tin T in the tank part (32), a pressure regulator (31) configured to change a pressure in the tank part (32), and a nozzle part (34) configured to eject liquefied tin T; a gas source (40) configured to supply gas containing hydrogen gas into the chamber (1); an evacuation device (46) configured to evacuate gaseous body in the chamber (1); and a controller (2) configured to control generation of a target, in which the controller (2) controls the evacuation device (46) to maintain an oxygen partial pressure in the chamber (1) at 4×10−5 Pa or lower.
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