DIRECT EXPOSURE MACHINE WITHOUT MASK
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United States of America Patent
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Issued Date -
May 2, 2019
app pub date -
Oct 31, 2018
filing date -
Oct 31, 2018
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Abstract
The present invention provides a direct exposure machine without mask, comprising a stage device and an exposure device. The stage device supports an exposed substrate, a surface of which coats with a sensitive layer. The exposure device shifts relatively to the stage device and includes a first exposure module. The first exposure module includes a light source, a penetrating scanner and multi-focus lenses. The light source outputs multiple beams arranged parallel to each other. The penetrating scanner includes a multifaceted prism driven to rotate, which has multiple facets. Each beam goes into one facet and out from the other to the sensitive layer of the exposed substrate. The multi-focus lenses are disposed between the light source and the multifaceted prism for focusing the beams to the substrate to be exposed.
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