LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME
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United States of America Patent
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Issued Date -
Mar 7, 2019
app pub date -
Apr 30, 2018
filing date -
Apr 30, 2018
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Abstract
A system includes a microlithography projection objective configured to image radiation from an object plane to an image plane along a radiation path. The microlithography projection objective has an optical axis. The microlithography projection objective includes a plurality of optical elements along the optical axis of the projection objective. The plurality of optical elements includes an optical element. During use of the system, a liquid is present. The system is configured so that, during use of the system, a distance between the optical element and the image plane is varied to reduce at least one aberration induced by a change in a temperature in the system.
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