Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask

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United States of America Patent

PATENT NO 10663856
APP PUB NO 20190064656A1
SERIAL NO

15685140

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Abstract

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An optical mask for use in a photolithography process, a method for fabricating the optical mask, and a method for fabricating an array of patterns on a substrate using the optical mask, wherein the optical mask includes an array of microstructures disposed on a mask substrate, and wherein the array of microstructures is arranged to transform a uniform optical exposure passing therethrough to an array of optical exposure patterns.

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Patent Owner(s)

Patent OwnerAddress
CITY UNIVERSITY OF HONG KONGTAT CHEE AVENUE KOWLOON HONG KONG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fang, Ming Kowloon, HK 144 2367
Ho, Johnny Chung Yin Shatin, HK 9 0
Shu, Lei Kowloon, HK 19 75

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