Wafer Support Assembly Including Ion Implantation Mask Structure
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United States of America Patent
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Feb 14, 2019
app pub date -
Dec 7, 2017
filing date -
Aug 8, 2017
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Abstract
A wafer support assembly can include a wafer chuck including a first surface and a second surface, where the first surface can have a central region that is configured to hold a wafer during ion implantation into the wafer, and an edge region surrounding the central region beyond an edge of the wafer when held in the central region, and the second surface opposing the first surface. An edge mask structure can cover at least a portion of the edge region of the first surface, where the edge mask structure can have a mask body with an inclined side surface facing the central region.
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