Sintered non-porous cathode and sputter ion vacuum pump containing the same

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United States of America Patent

PATENT NO 11056326
APP PUB NO 20190051504A1
SERIAL NO

16068803

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Abstract

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The present invention relates to cathodes electrodes compositions suitable to provide a pumping mechanism which exhibits an extremely high pumping speed and capacity of noble gas suitable to be used in several vacuum devices as for example sputter ion vacuum pumping systems comprising them as active element.

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Patent Owner(s)

Patent OwnerAddress
SAES GETTERS S P AVIALE ITALIA 77 LAINATE (MI) 20045

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gallitognotta, Alessandro Origgio, IT 27 68
Porcelli, Tommaso Milan, IT 4 3
Siviero, Fabrizio Lainate, IT 2 4

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