Laser patterning of multi-layer structures
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United States of America Patent
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May 18, 2021
Grant Date -
Jan 31, 2019
app pub date -
Sep 25, 2018
filing date -
Feb 21, 2013
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Abstract
A method of non-ablatively laser patterning a multi-layer structure, the multi-layer structure including a substrate, a first layer disposed on the substrate, a second layer disposed on the first layer, and a third layer disposed on the second layer, the method including generating at least one laser pulse having laser parameters selected for non-ablatively changing the conductivity a selected portion of the third layer such that the selected portion becomes non-conductive, and directing the pulse to the multi-layer structure, wherein the conductivity of the first layer is not substantially changed by the pulse.
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