PHOTOMASK AND METHOD FOR MANUFACTURING ACTIVE SWITCH ARRAY SUBSTRATE USING SAME
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United States of America Patent
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N/A
Issued Date -
Jan 10, 2019
app pub date -
May 31, 2017
filing date -
May 31, 2017
priority date (Note) -
Published
status (Latency Note)
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Abstract
This application relates to a photomask and a method for manufacturing an active switch array substrate using same. The photomask includes: a light penetration region, including a light penetration substrate; a translucent region, disposed on the light penetration substrate and formed of chromium or a chromium compound; a light shielding region, disposed on the light penetration substrate; and reflective material layers of a plurality of fine lines, disposed between the translucent region and the light shielding region and formed of chromium or a chromium compound, where the light penetration rate of the photomask is regulated according to doping and a distribution density of a low reflective material, so that the light penetration rate of the translucent region is lower than the light penetration rate of the light transmitting region and is higher than the light penetration rate of the light shielding region.
First Claim
Other Claims data not available
Family
| Country | kind | publication No. | Filing Date |
|---|---|---|---|
| CN | A | CN107085321 | May 02, 2017 |
| WO | A1 | WO2018201545 | May 31, 2017 |
International Classification(s)
- 2017 Application Filing Year
- H01L Class
- 30754 Applications Filed
- 25260 Patents Issued To-Date
- 82.14 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- H01L Class
- 32.24 % this patent is cited more than
- 6 Age