PARTICLE FILTERING APPARATUS
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United States of America Patent
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Issued Date -
Jan 3, 2019
app pub date -
Jun 28, 2018
filing date -
Jun 28, 2018
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Abstract
A gas cleaning apparatus includes:
- an ion source to provide an ion beam,a charging zone to form charged particles by exposing particles of a particle-laden gas to the ion beam, anda filter element to collect the charged particles,wherein the ion source includes a corona electrode to generate ions by a corona discharge, the ion source is arranged to form the corona discharge in a protective gas, and wherein the apparatus is arranged to form the ion beam by using an electric field to draw the generated ions from the corona discharge to the particle-laden gas.
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