SEAMLESS CYLINDRICAL OFFSET PRINTING PLATE AND MANUFACTURING METHOD THEREFOR AND REPRODUCTION PROCESSING METHOD

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United States of America Patent

APP PUB NO 20180370268A1
SERIAL NO

16060601

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided are a seamless cylindrical offset printing plate which enables seamless continuous printing to be performed, a manufacturing method therefor, and a reproduction processing method. The seamless cylindrical offset printing plate comprises: a cylindrical plate base material; a hydrophilic satin-like rough surface which is formed on a surface of the cylindrical plate base material; and a hydrophobic resist pattern part which is formed on the satin-like rough surface, wherein an exposed part of the satin-like rough surface serves as a non-printing area and the resist pattern part serves as a printing area.

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Patent Owner(s)

Patent OwnerAddress
THINK LABORATORY CO LTDKASHIWA-SHI CHIBA 277-8525

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
SHIGETA, Tatsuo Chiba, JP 54 317

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