Cleaning composition and method for fabricating electronic device using the same
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United States of America Patent
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Oct 6, 2020
Grant Date -
Dec 6, 2018
app pub date -
Mar 1, 2018
filing date -
May 31, 2017
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Abstract
A method for fabricating an electronic device including a semiconductor memory may include: forming a material layer over a substrate; forming a material pattern by etching the material layer, the etching providing an etch residue on sidewalls of the material pattern; and removing the etch residue, wherein removing of the etch residue includes performing a cleaning process using a cleaning composition including water and a fluorine-containing compound or an amine, and having a pH in a range of 7 to 14.
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