Mask blank having a resist layer, method for manufacturing mask blank having resist layer, and method for manufacturing transfer mask
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United States of America Patent
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Jul 14, 2020
Grant Date -
Nov 22, 2018
app pub date -
Nov 7, 2016
filing date -
Nov 18, 2015
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Abstract
A mask blank having a resist layer, which enables charge-up to be suppressed during electron beam irradiation. The mask blank having a resist layer includes a substrate having a thin film, a resist layer formed on a surface of the thin film, and a conductive layer formed on the resist layer. The conductive layer includes a first metal layer containing aluminum as a main component thereof and a second metal layer made of a metal other than aluminum. The first metal layer is formed on the resist layer side of the second metal layer.
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