Nano-electromechanical system (NEMS) device structure and method for forming the same
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United States of America Patent
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Jun 9, 2020
Grant Date -
Nov 22, 2018
app pub date -
Jun 15, 2018
filing date -
Jan 27, 2016
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Abstract
A NEMS device structure and a method for forming the same are provided. The NEMS device structure includes a substrate and an interconnect structure formed over the substrate. The NEMS device structure includes a dielectric layer formed over the interconnect structure and a beam structure formed in and over the dielectric layer, wherein the beam structure includes a plurality of strip structures. The NEMS device structure includes a cap structure formed over the dielectric layer and the beam structure and a cavity formed between the beam structure and the cap structure.
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