PURIFICATION METHOD AND PURIFICATION APPARATUS FOR OFF-GAS

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United States of America Patent

APP PUB NO 20180280874A1
SERIAL NO

15996711

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Abstract

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The present invention relates to a purification method and a purification apparatus for off-gas. More specifically, the present invention relates to a purification method and a purification apparatus for off-gas, capable of lowering the concentration of hydrogen chloride and separating high-purity hydrogen from the off-gas, which is discharged after performing a polysilicon deposition process by a chemical vapor deposition reaction.

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Patent Owner(s)

Patent OwnerAddress
HANWHA CHEMICAL CORPSEOUL SOUTH KEREAN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
AHN, Gui Ryong Daejeon, KR 14 39
KIM, Bo Kyung Daejeon, KR 30 119
KIM, Gil Ho Daejeon, KR 15 25
KIM, Sang Ah lncheon, KR 7 6
LEE, Won lk Bucheon-si, KR 1 0
PARK, Jea Sung Daejeon, KR 5 4

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