POLISHING LIQUID, POLISHING LIQUID SET, AND SUBSTRATE POLISHING METHOD
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United States of America Patent
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Sep 13, 2018
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Jun 13, 2016
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Jun 13, 2016
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A polishing liquid comprising a liquid medium, an abrasive grain and a polymer, wherein the polymer includes a first molecular chain having a functional group directly bonded thereto, and a second molecular chain branched from the first molecular chain, and the functional group is at least one selected from the group consisting of a carboxyl group, a carboxylic acid salt group, a hydroxyl group, a sulfo group and a sulfonic acid salt group.
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