METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
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United States of America Patent
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Issued Date -
Aug 30, 2018
app pub date -
Jan 24, 2018
filing date -
Feb 6, 2007
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Abstract
Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
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International Classification(s)
- G01M:TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR S....
- G05B:CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTION....
- G01N:INVESTIGATING OR ANALYSING MATERIALS BY DETERMININ....
- G02B:OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G01B:MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIME....
- G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
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