POROUS NICKEL THIN FILM AND MANUFACTURING METHOD THEREOF

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20180230615A1
SERIAL NO

15575236

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Provided is a porous nickel thin film having a flexibility value of no more than 15.0 N/mm.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY3-1 KASUMIGASEKI 1- CHOME CHIYODA-KU TOKYO 1008921
SANNO CO LTDYOKOHAMA-SHI KANAGAWA PREFECTURE

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ENDO, Naruki Koriyama-shi, Fukushima, JP 2 0
KOSONE, Takashi Tsukuba-shi, Ibaraki, JP 1 0
KUMAKAWA, Masashi Tsukuba-shi, Ibaraki, JP 1 0
MAEDA, Tetsuhiko Koriyama-shi, Fukushima, JP 2 0
SUZUKI, Satoshi Koriyama-shi, Fukushima, JP 709 8720
YAEGASHI, Satoshi Yokohama-shi, Kanagawa, JP 4 7

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation