(METH)ACRYLIC BLOCK COPOLYMER

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United States of America Patent

SERIAL NO

15746163

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Abstract

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The invention provides a (meth)acrylic block copolymer that exhibits a high curing rate when irradiated with active energy rays and also has a low viscosity. The (meth)acrylic block copolymer includes a methacrylic polymer block (a1) and a methacrylic polymer block (a2) that each have an active energy ray curable group including a partial structure (1) of the following general formula (1), and further includes an acrylic polymer block (B) that has no active energy ray curable groups and is present between the methacrylic polymer block (a1) and the methacrylic polymer block (a2). The content of monomer units derived from methyl methacrylate relative to all monomer units in the methacrylic polymer block (a1) and the methacrylic polymer block (a2) is not less than 30 mass %. The content of monomer units derived from an alkyl acrylate ester having an alkyl group with 6 or more carbon atoms relative to all monomer units in the acrylic polymer block (B) is not less than 40 mass %.

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Patent Owner(s)

Patent OwnerAddress
KURARAY CO LTD1621 SAKAZU KURASHIKI-SHI OKAYAMA 710-0801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
MATSUURA, Mikiya Tsukuba-shi, JP 5 1
SHACHI, Kenji Tsukuba-shi, JP 29 163
SHIMIZU, Seiya Tsukuba-shi, JP 88 1122
TAKAI, Junya Tsukuba-shi, JP 3 1

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