Method for treating waste liquid from process of etching indium tin oxide
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United States of America Patent
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Feb 12, 2019
Grant Date -
Jul 5, 2018
app pub date -
Aug 24, 2017
filing date -
Jan 5, 2017
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Abstract
This disclosure provides a method for treating an etching waste liquid from an etching process of indium tin oxide comprising hydrochloric acid, acetic acid, tin ions, indium ions and water, comprising the steps of: distilling the etching waste liquid to obtain a distillate comprising hydrochloric acid and acetic acid and a post-distillation liquid comprising tin ions and indium ions; generating a precipitate by reacting tin ions in the post-distillation liquid with sulfide ions to remove tin ions from the solution so as to obtain a post-precipitation solution containing indium ions; and electrolyzing the post-precipitation solution to obtain crude indium.
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