Fluid droplet methodology and apparatus for imprint lithography
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United States of America Patent
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Apr 28, 2020
Grant Date -
Jun 14, 2018
app pub date -
Dec 12, 2016
filing date -
Dec 12, 2016
priority date (Note) -
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Abstract
A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate; during a first pass, dispensing the formable material onto the substrate to form a first part of the fluid droplet pattern for an imprint field; offsetting the fluid dispense ports and substrate relative to each other in an offset direction; and during a second pass, dispensing the formable material onto the substrate to form a second part of the fluid droplet pattern for the imprint field. The method can be used to form a patterned layer over a semiconductor wafer in fabricating an electronic device. An apparatus can be configured to carry out the method.
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