Ebeam three beam aperture array

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United States of America Patent

PATENT NO 10067416
APP PUB NO 20180143526A1
SERIAL NO

15873782

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Abstract

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Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA includes three distinct aperture arrays of different pitch.

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Patent Owner(s)

Patent OwnerAddress
INTEL CORPORATIONCALIFORNIA USA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Borodovsky, Yan A Portland, US 21 382
Nelson, Donald W Beaverton, US 35 377
Phillips, Mark C Portland, US 28 122

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