Charge stripping film for charge stripping device of ion beam
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United States of America Patent
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Jun 25, 2019
Grant Date -
Apr 12, 2018
app pub date -
Oct 13, 2017
filing date -
Apr 15, 2015
priority date (Note) -
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status (Latency Note)
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Abstract
A charge stripping film for a charge stripping device of ion beam is a carbon film produced by annealing a polymer film, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%. A charge stripping film for a charge stripping device of ion beam is a carbon film having a thermal conductivity in a film surface direction at 25° C. of at least 300 W/mK, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%.
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International Classification(s)
- H01J:ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- C01B:NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
- G21K:TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNET....
- B29C:SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTAN....
- B29D:PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FRO....
- H05H:PLASMA TECHNIQUE
- B32B:LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA....
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