Imaging optical unit and projection exposure unit including same

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United States of America Patent

PATENT NO 10656400
APP PUB NO 20180074303A1
SERIAL NO

15728812

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Abstract

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An imaging optical unit for projection lithography has a plurality of mirrors for guiding imaging light from an object field into an image field. The object field is spanned by two object field coordinates, with a normal coordinate being perpendicular thereto. Imaging light propagates in a first imaging light plane through at least one first plane intermediate image of the imaging optical unit. In a second imaging light plane, the imaging light propagates through at least one second plane intermediate image of the imaging optical unit. The number of first plane intermediate images and the number of second plane intermediate images differ from one another. An imaging optical unit with reduced production costs emerges.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STR 2 73447 OBERKOCHEN 73447

International Classification(s)

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  • 2017 Application Filing Year
  • G02B Class
  • 11360 Applications Filed
  • 8685 Patents Issued To-Date
  • 76.46 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Schwab, Markus Aalen, DE 50 431

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  • 1 Citation Count
  • G02B Class
  • 43.63 % this patent is cited more than
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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges27143263150433256421101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 90100 +020040060080010001200140016001800200022002400260028003000320034003600

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