Imaging optical unit and projection exposure unit including same
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United States of America Patent
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May 19, 2020
Grant Date -
Mar 15, 2018
app pub date -
Oct 10, 2017
filing date -
Apr 14, 2015
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Abstract
An imaging optical unit for projection lithography has a plurality of mirrors for guiding imaging light from an object field into an image field. The object field is spanned by two object field coordinates, with a normal coordinate being perpendicular thereto. Imaging light propagates in a first imaging light plane through at least one first plane intermediate image of the imaging optical unit. In a second imaging light plane, the imaging light propagates through at least one second plane intermediate image of the imaging optical unit. The number of first plane intermediate images and the number of second plane intermediate images differ from one another. An imaging optical unit with reduced production costs emerges.
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