Simultaneous multi-directional laser wafer inspection

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10739275
APP PUB NO 20180073993A1
SERIAL NO

15697386

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Abstract

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Disclosed is apparatus for inspecting a sample. The apparatus includes illumination optics for simultaneously directing a plurality of incident beams at a plurality of azimuth angles towards a sample and collection optics for directing a plurality of field portions of output light from two or more of the plurality of angles towards two or more corresponding sensors. The two or more sensors are arranged for receiving the field portions corresponding to two or more angles and generating two or more corresponding images. The apparatus further comprises a processor for analyzing the two or more images to detect defects on the sample.

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Patent Owner(s)

  • KLA-TENCOR CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Liu, Sheng San Jose, US 269 4641
Tsai, Ben-ming Benjamin Saratoga, US 3 32
Zhao, Guoheng Palo Alto, US 112 2261

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