RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTURE

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United States of America Patent

SERIAL NO

15653318

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Abstract

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A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) having a repeating structure of styrene units; a block (b2) having a repeating structure of methyl methacrylate units partially substituted with a constituent unit represented by general formula (h1); and a number average molecular weight of less than 28,000. In general formula (h1), Rh0 is a hydrophilic functional group.

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Patent Owner(s)

Patent OwnerAddress
TOKYO OHKA KOGYO CO LTDKANAGAWA KANAGAWA
NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITYKITA 8-JYO NISHI 5-CHOME KITA-KU SAPPORO-SHI HOKKAIDO 0600808 ?0600808

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
DAZAI, Takahiro Kawasaki-shi, JP 73 876
ISONO, Takuya Sapporo-shi, JP 5 1
MAEHASHI, Takaya Kawasaki-shi, JP 21 58
MIYAGI, Ken Kawasaki-shi, JP 69 670
SATOH, Toshifumi Sapporo-shi, JP 17 114
SESHIMO, Takehiro Kawasaki-shi, JP 56 396
YAMANO, Hitoshi Kawasaki-shi, JP 18 57

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