Substrate cleaning device, substrate processing apparatus and substrate cleaning method
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United States of America Patent
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Jun 2, 2020
Grant Date -
Mar 15, 2018
app pub date -
Sep 7, 2017
filing date -
Sep 13, 2016
priority date (Note) -
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Abstract
A rotating substrate is cleaned by a polishing head and a cleaning brush. A first trajectory is formed by movement of the polishing head along a first path. A second trajectory is formed by movement of the cleaning brush along a second path. A region in which the first and second paths overlap with each other is defined as an interference region. The polishing head moves from a center towards an outer peripheral end of the substrate, and it is determined whether the polishing head has moved out of the interference region. At a time point at which it is determined that the polishing head has moved out of the interference region, the cleaning brush starts moving from the outer peripheral end towards the center of the substrate.
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