Vaporization supply apparatus

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United States of America Patent

PATENT NO 10646844
APP PUB NO 20180071702A1
SERIAL NO

15565696

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Abstract

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A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.

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Patent Owner(s)

Patent OwnerAddress
FUJIKIN INCORPORATED2-3-2 ITACHIBORI NISHI-KU OSAKA-SHI OSAKA

International Classification(s)

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  • 2016 Application Filing Year
  • C23C Class
  • 3247 Applications Filed
  • 2111 Patents Issued To-Date
  • 65.02 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20162017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hidaka, Atsushi Osaka, JP 32 428
Hirao, Keiji Osaka, JP 47 610
Hirata, Kaoru Osaka, JP 73 969
Ikeda, Nobukazu Osaka, JP 234 4423
Nagase, Masaaki Osaka, JP 88 1119
Nakatani, Takatoshi Osaka, JP 14 25
Nishino, Kouji Osaka, JP 169 2577
Sugita, Katsuyuki Osaka, JP 57 387
Yamashita, Satoru Osaka, JP 18 344

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  • 0 Citation Count
  • C23C Class
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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges1055695351018101 - 1011 - 2021 - 3031 - 4041 - 5051 - 600501001502002503003504004505005506006507007508008509009501000105011001150

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7.5 Year Payment $3600.00 $1800.00 $900.00 Nov 12, 2027
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