SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
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United States of America Patent
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Mar 8, 2018
app pub date -
Aug 29, 2017
filing date -
Sep 2, 2016
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Abstract
According to one embodiment, a substrate cleaning apparatus that cleans a substrate while rotating the substrate, the substrate cleaning apparatus includes: a first cleaning liquid supplier that sprays cleaning liquid in a spray shape at a first spraying angle toward a center of the substrate; and a second cleaning liquid supplier that sprays cleaning liquid in a spray shape at a second spraying angle greater than the first spraying angle toward an area between the center of the substrate and an edge of the substrate.
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