TREATMENT AGENT FOR INHIBITING SUBSTRATE PATTERN COLLAPSE AND TREATMENT METHOD OF SUBSTRATE

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United States of America Patent

SERIAL NO

15812005

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Abstract

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A treatment agent for inhibiting substrate pattern collapse contains a polymer and a polar solvent. A treatment method of a substrate includes: applying the treatment agent onto a substrate having a pattern formed thereon; and drying the treatment agent applied onto the substrate. The polymer is preferably a hydrophilic polymer. In addition, the polymer preferably has at least one functional group selected from a hydroxy group, a carboxy group, an amide group, an amino group, a sulfo group and an aldehyde group. Furthermore, the polymer is preferably one selected from a vinyl polymer, a polysaccharide, a polyester, a polyether and a polyamide.

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Patent Owner(s)

Patent OwnerAddress
JSR CORPORATION1-9-2 HIGASHI-SHINBASHI MINATO-KU TOKYO 105-8640

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHUNG, Kang-go Tokyo, JP 9 21
FUJITA, Kenji Tokyo, JP 85 1312
TAKIMOTO, Yoshio Tokyo, JP 20 84

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