THIN FILM MANUFACTURING DEVICE AND THIN FILM MANUFACTURING METHOD

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United States of America Patent

SERIAL NO

15680735

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Abstract

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An object of the invention is to provide a thin film manufacturing device which further reduces a load on a substrate. Provided is a thin film manufacturing device for forming a thin film on a substrate by supplying a mist of a solution including a thin-film forming material to the substrate, characterized in that the device includes: a plasma generation unit including a first electrode and a second electrode disposed closer to one surface of the substrate, which generates plasma between the first electrode and the second electrode; and a mist supply unit which passes the mist between the first electrode and the second electrode and supplies the mist to the substrate.

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Patent Owner(s)

Patent OwnerAddress
NIKON CORPORATIONTOKYO 140-8601
NATIONAL UNIVERSITY CORPORATION KUMAMOTO UNIVERSITYXIONGBEN CITY XIONGBEN COUNTY JAPAN'S CENTRAL BLACK 2 CHOME 39 NO 1 KUMAMOTO-SHI KUMAMOTO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
NAKAMURA, Yusui Kumamoto, JP 2 37
NAKAZUMI, Makoto Yamato, JP 19 21
NAMIHIRA, Takao Kumamoto, JP 7 16
NARA, Kei Yokohama, JP 46 461
NISHI, Yasutaka Tokyo, JP 23 55
TAKAMURA, Norimitsu Fukuoka, JP 1 7

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