Vacuum arc deposition apparatus and deposition method
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United States of America Patent
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Aug 4, 2020
Grant Date -
Mar 8, 2018
app pub date -
Nov 8, 2017
filing date -
Jun 24, 2015
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Abstract
A vacuum arc deposition apparatus for forming a ta-C film on a substrate using arc discharge includes a holding unit that holds a target unit, an anode unit into which electrons emitted from the target unit flow, and a power supply that supplies, between the target unit and the anode unit, a current for generating a plasma by arc discharge. The current supplied by the power supply at the time of the arc discharge is generated by superimposing, on a DC current, a pulse current of a pulse frequency not higher than 140 Hz.
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