REDUCING RESIDUAL MONOMER CONTENT IN COPOLYMERS OF STYRENE AND VINYLPYRIDINE

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United States of America Patent

APP PUB NO 20180057616A1
SERIAL NO

15689151

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Abstract

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Copolymers of styrene and vinylpyridine having residual monomer levels of less than about 1000 parts per billion and processes for preparing said copolymers.

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Patent Owner(s)

Patent OwnerAddress
NOVUS INTERNATIONAL INC20 RESEARCH PARK DRIVE ST CHARLES MO 63304

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arhancet, Graciela B St. Charles, US 49 363
Embse, Richard Vonder St. Charles, US 7 17
Hume, John St. Charles, US 7 19
Wang, Xiaojun St. Charles, US 139 517

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