EXPOSURE METHOD, SUBSTRATE AND EXPOSURE APPARATUS
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United States of America Patent
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Jul 24, 2017
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Aug 19, 2016
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Abstract
An exposure method, a substrate and an exposure apparatus are disclosed. In one embodiment, an exposure method includes: forming a mask combination from at least two masks; and exposing, by using the mask combination, a film layer to be exposed on a base substrate, until a complete exposed pattern is formed on the film layer to be exposed.
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