Nanoporous semiconductor thin films
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 24, 2020
Grant Date -
Feb 22, 2018
app pub date -
Aug 14, 2017
filing date -
Aug 16, 2016
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present disclosure provides a method of fabricating a nanoporous thin film device comprising depositing a template on a substrate to form a nanoporous insulating layer, the template comprising one or more polymers capable of forming pores when polymerized and at least one cross-linking agent, and depositing a second layer (e.g. organic semiconductor, semiconductor, insulator) on the nonporous insulating layer to form a thin film having a plurality of isolated nanopores on the surface. Nanoporous semiconductor thin films made by these methods is provided. Sensors and devices comprising the nanoporous thin film is also disclosed.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully