Dressing device, polishing apparatus, holder, housing and dressing method
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United States of America Patent
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Apr 28, 2020
Grant Date -
Feb 15, 2018
app pub date -
Aug 11, 2017
filing date -
Aug 12, 2016
priority date (Note) -
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Abstract
A dressing device including: a disk that has an opening on an inside, the disk dressing a polishing surface for polishing a substrate; a rotatable holder, the disk being coupled to a lower surface side of the holder, the holder being provided with a first flow passage that passes from a lower surface to an upper surface, the lower surface being inside an outer edge of the opening of the disk; and a housing that is provided with a distance from the upper surface of the holder, the housing being provided with a second flow passage in an interior, the housing being fixed such that an opening of the second flow passage faces the upper surface of the holder, the second flow passage being connected with a supply source and a suction source of process liquid.
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