Substrate treatment device and substrate treatment method
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United States of America Patent
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Aug 4, 2020
Grant Date -
Feb 15, 2018
app pub date -
Aug 8, 2017
filing date -
Aug 9, 2016
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate treatment device according to an embodiment includes a placement portion on which a substrate is placed and rotated, a liquid supply portion which supplies a liquid to a surface on an opposite side to the placement portion of the substrate, a cooling portion which supplies a cooling gas to a surface on a side of the placement portion of the substrate, and a control portion which controls at least one of a rotation speed of the substrate, a supply amount of the liquid, and a flow rate of the cooling gas. The control portion brings the liquid present on a surface of the substrate into a supercooled state and causes at least a part of the liquid brought into the supercooled state to freeze.
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