PHOTORESIST PRE-BAKING METHOD, PHOTORESIST PRE-BAKING DEVICE AND LITHOGRAPHIC APPARATUS
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Jul 25, 2017
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Aug 12, 2016
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Abstract
A photoresist pre-baking method, a photoresist pre-baking device and a lithographic apparatus are disclosed. The device includes a heating plate and a temperature controller. The heating plate includes a plurality of heating units, and the heating plate is configured to heat a substrate to be baked through the plurality of heating units, and the temperature controller is electrically connected with each of the heating units, and configured to adjust a heating parameter of each of the heating units of the heating plate, the heating parameter including at least one of a heating temperature and a heating duration.
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