SPUTTERING TARGET HAVING REVERSE BOWNG TARGET GEOMETRY
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Feb 23, 2016
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Mar 2, 2015
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Generally planar sputter targets having a reverse bow surface (i.e., convexity) facing the magnets in a magnetron assembly is provided. Methods of making Cu and Cu alloy targets are provided including an annealing step performed at temperatures of from 1100-1300 F for a period of about 1-2 hours. Targets made by the methods have increased grain sizes on the order of 30-90 microns.
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