METHOD FOR PRODUCING RELIEF-PATTERN FORMING, APPARATUS FOR PRODUCING THE SAME, AND SEAL

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United States of America Patent

SERIAL NO

15794510

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Abstract

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A method and an apparatus for producing a relief-pattern forming, the method and apparatus being suitable for producing a film-like material, such as an embossed film, having a fine relief-structure pattern formed on a surface thereof so as to have a distinctive optical effect with higher quality, good productivity, and fewer defects. A transfer pattern printed layer having an inverted structure of a relief-structure pattern is formed on a second substrate by printing a transfer pattern onto the surface of a first substrate on which the relief-structure pattern is formed at a predetermined position by registration with the relief-structure pattern followed by drying, laminating with the second substrate, curing and peeling.

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Patent Owner(s)

Patent OwnerAddress
TOPPAN PRINTING CO LTD5-1 TAITO 1-CHOME TAITO-KU TOKYO 110-8560

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
SHINODA, Koichi Tokyo, JP 16 167

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