Method and apparatus for depositing atomic layers on a substrate

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10676822
APP PUB NO 20180037994A1
SERIAL NO

15782205

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Roozeboom, Freddy s-Gravenhage, NL 54 1762
Van, Deelen Joop s-Gravenhage, NL 6 41
Vermeer, Adrianus Johannes Petrus Maria s-Gravenhage, NL 27 652

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Dec 9, 2027
11.5 Year Payment $7400.00 $3700.00 $1850.00 Dec 9, 2031
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00