Method for etching magnetic layer including isopropyl alcohol and carbon dioxide
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United States of America Patent
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Sep 11, 2018
Grant Date -
Feb 1, 2018
app pub date -
Mar 1, 2016
filing date -
Mar 12, 2015
priority date (Note) -
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Abstract
A method of an embodiment includes: mounting a workpiece, which includes the magnetic layer, on an electrostatic chuck provided in a processing container of a plasma processing apparatus; and etching the magnetic layer to generate plasma of a processing gas including isopropyl alcohol and carbon dioxide in the processing container. In an embodiment, a pressure of a space in the processing container is set to be 1.333 Pa or less, a temperature of the electrostatic chuck is set to be −15° C. or lower, and a partial pressure of isopropyl alcohol is set to be equal to or lower than a saturation vapor pressure of the isopropyl alcohol.
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