Structure and method to measure focus-dependent pattern shift in integrated circuit imaging
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United States of America Patent
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Feb 20, 2018
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Jul 28, 2016
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Jul 28, 2016
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Abstract
Various embodiments include measurement structures and methods for measuring integrated circuit (IC) images. In some cases, a measurement structure for use in measuring an image of an IC, includes: a first section having a positive shift spacing pattern; a second section, on an opposite side of the measurement structure, having a negative shift spacing pattern; and a third section having a reference spacing pattern for calibrating a measurement from at least one of the first section or the second section.
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