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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
ASML NETHERLANDS B V	P O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

• G02B:OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
BASELMANS, Johannes Jacobus Matheus	Oirschot, NL	163	4062
# of filed Patents : 163 Total Citations : 4062
BOGAART, Erik Willem	Someren, NL	14	92
# of filed Patents : 14 Total Citations : 92
BOTMA, Hako	Eindhoven, NL	18	171
# of filed Patents : 18 Total Citations : 171
DE, VRIES Gosse Charles	Veldhoven, NL	33	187
# of filed Patents : 33 Total Citations : 187
Donker, Rilpho Ludovicus	Eindhoven, NL	8	67
# of filed Patents : 8 Total Citations : 67
FRIJNS, Olav Waldemar Vladimir	Rosmalen, NL	22	174
# of filed Patents : 22 Total Citations : 174
KRUIZINGA, Borgert	Zoetermeer, NL	20	657
# of filed Patents : 20 Total Citations : 657
LOOPSTRA, Erik Roelof	Eindhoven, NL	325	13468
# of filed Patents : 325 Total Citations : 13468
NIENHUYS, Han-Kwang	Utrecht, NL	37	160
# of filed Patents : 37 Total Citations : 160

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Patent Citation Ranking

• 5 Citation Count
• G02B Class

• 28.28 % this patent is cited more than
• 7 Age

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Aug 1, 2025
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Aug 1, 2029

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 2018/0031,982

RADIATION SYSTEM

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Abstract

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A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.

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Description

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Claims

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